JPS645443U - - Google Patents

Info

Publication number

JPS645443U

JPS645443U JP1987099111U JP9911187U JPS645443U JP S645443 U JPS645443 U JP S645443U JP 1987099111 U JP1987099111 U JP 1987099111U JP 9911187 U JP9911187 U JP 9911187U JP S645443 U JPS645443 U JP S645443U

Authority

JP

Japan

Prior art keywords

etching

ray exposure

silicon

spherical

exposure mask

Prior art date

1987-06-26

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000005530 etching Methods 0.000 claims description 8
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
• 229910052710 silicon Inorganic materials 0.000 claims description 5
• 239000010703 silicon Substances 0.000 claims description 5
• 238000003756 stirring Methods 0.000 claims description 2
• 239000000758 substrate Substances 0.000 claims description 2
• BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 claims 1
• 229910052581 Si3N4 Inorganic materials 0.000 description 1
• 238000010586 diagram Methods 0.000 description 1
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1